Tandem Press participates in international touring exhibition

On Sunday, Oct. 10, American Printmaking Now will open at the National Art Museum of China in Beijing, and prints from the University of Wisconsin–Madison’s Tandem Press will be among those featured.

Following Beijing, the exhibition will travel to Guan Shanyue Art Museum in Shenzhen City (Nov. 16-Dec. 5), Zhejiang Art Museum (Dec. 28-Jan. 23) and the Shanghai Art Museum (March 8-April 8) in succession.

“This is an extraordinary opportunity for Tandem Press and recognizes the importance of the Press on an international level,” says Paula Panczenko, director of the Tandem Press.

The exhibition was curated by Xiaowen Chen, associate professor of print media at Alfred University, and is accompanied by a catalogue that includes essays by Riva Castleman, former chief curator of prints the Museum of Modern Art New York; Chen; and Faye Hirsch, associate editor of Art in America. Tandem Press prints will showcase work by the artists Robert Cottingham, Judy Pfaff, Squeak Carnwath, Philip Pearlstein and Nicola López.

The exhibition will include 90 prints by 45 artists. The prints were selected from eight print publishers throughout the United States including Gemini, Graphicstudio, IEA (Alfred University), Harlan & Weaver, LeRoy Neiman, Pace Prints, Tandem Press and Universal Limited Art Editions (ULAE).

Tandem Press was founded in 1987. It is a self-supporting print publisher affiliated with the Department of Art in the School of Education at UW–Madison.